JPH0352207B2 - - Google Patents

Info

Publication number
JPH0352207B2
JPH0352207B2 JP58035737A JP3573783A JPH0352207B2 JP H0352207 B2 JPH0352207 B2 JP H0352207B2 JP 58035737 A JP58035737 A JP 58035737A JP 3573783 A JP3573783 A JP 3573783A JP H0352207 B2 JPH0352207 B2 JP H0352207B2
Authority
JP
Japan
Prior art keywords
stage
wafer
pattern
reticle
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58035737A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59161815A (ja
Inventor
Shoichi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP58035737A priority Critical patent/JPS59161815A/ja
Publication of JPS59161815A publication Critical patent/JPS59161815A/ja
Priority to US06/800,094 priority patent/US4629313A/en
Priority to US06/897,644 priority patent/US4711567A/en
Publication of JPH0352207B2 publication Critical patent/JPH0352207B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58035737A 1982-10-22 1983-03-07 投影露光装置 Granted JPS59161815A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58035737A JPS59161815A (ja) 1983-03-07 1983-03-07 投影露光装置
US06/800,094 US4629313A (en) 1982-10-22 1985-11-20 Exposure apparatus
US06/897,644 US4711567A (en) 1982-10-22 1986-08-18 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58035737A JPS59161815A (ja) 1983-03-07 1983-03-07 投影露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2031370A Division JPH038319A (ja) 1990-02-14 1990-02-14 露光装置の位置合わせ装置及び方法

Publications (2)

Publication Number Publication Date
JPS59161815A JPS59161815A (ja) 1984-09-12
JPH0352207B2 true JPH0352207B2 (en]) 1991-08-09

Family

ID=12450135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58035737A Granted JPS59161815A (ja) 1982-10-22 1983-03-07 投影露光装置

Country Status (1)

Country Link
JP (1) JPS59161815A (en])

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2610815B2 (ja) * 1985-09-19 1997-05-14 株式会社ニコン 露光方法
JPS62158341A (ja) * 1985-12-30 1987-07-14 Hoya Corp 移動ステ−ジ
JPH0754793B2 (ja) * 1986-04-21 1995-06-07 株式会社ニコン 投影露光装置
JPH0787175B2 (ja) * 1986-09-19 1995-09-20 キヤノン株式会社 露光方法
JPH01283927A (ja) * 1988-05-11 1989-11-15 Mitsubishi Electric Corp 縮小投影露光装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3173163D1 (en) * 1980-02-29 1986-01-23 Eaton Optimetrix Inc Alignment apparatus
JPS587823A (ja) * 1981-07-06 1983-01-17 Hitachi Ltd アライメント方法およびその装置
JPS5976425A (ja) * 1982-10-25 1984-05-01 Canon Inc 半導体用焼付装置

Also Published As

Publication number Publication date
JPS59161815A (ja) 1984-09-12

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